(+86) 188 60888 263 Mon - Fri 09:00 - 18:00 Balance new Material Co., Ltd., 2488 Huan Qing Road,China
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Alloy Sputtering Targets


Material Composition Purity Sputtering Target
Rotatable Planar
CrAl Cr-70Al,Cr-50Al,Cr-30Al (at%) 99.95% max  
TiAl Ti-70Al,Ti-67Al,Ti-50Al,Ti-30Al (at%) 99.95% max  
SiAl Si-10Al,Si-30Al ( or customized ) 99.95% max
SiZr Si-30Zr 99.9% max  
NiCr Ni-20Cr,Ni-50Cr,Ni-70Cr (wt%) 99.95% max
NiV Ni-7V(wt%) 99.95% max  
CuZr customized 99.95% max  
NiFe Ni-20Fe (wt%) ( or customized ) 99.95% max